This document discusses antireflection coatings. [1] Antireflection coatings are applied to optical surfaces to reduce reflection and improve efficiency. [2] They work through destructive interference between light reflecting off the coating surface and light reflecting off the underlying surface. [3] Common techniques for depositing antireflection coatings include chemical vapor deposition, physical vapor deposition, and plasma-enhanced chemical vapor deposition.
3. What is antireflective coating ?
Antireflective or anti-reflection (AR) coating is a type of optical
coating applied to the surface of lenses and other optical devices to
reduce reflection.This improves the efficiency of the system since less
light is lost.
Antireflection is achieved by destructive interference between……
coating coating
Where does blue light disappear ?
4. ’
For destructive interference Δ = (2m+1) λ/2
2nd = (2m+1) λ/2 => d = λ/4nc = λ’/4
d = minimum required thickness of coating
λ’ = wavelength in coating medium
5. Formation of antireflection coating
CHEMICAL VAPOUR DEPOSITION
:
Layer deposition involves chemical reactions
Large density films
Good stoichiometry & uniformity over large surface area.
SiO2 SiN, SiON, SiOC , and TiO2 with proper thickness are
the common AR material deposited chemically.
LIMITITATION :
Required high temp to produce high quality material and for
many application the substrate cannot tolerate being heated
so not useful in that case .
6. PHYSICAL VAPOUR DEPOSITION
A variety of vacuum deposition
Purely physical process , no
chemical reaction involved.
Process involved three steps:
• Evaporation
• Transportation
• Deposition
multiple coating layers possible
MgF2 coating on glass
7. Advantages of PVD
Almost any type of inorganic material can be
used as well as some kinds of organic materials.
The process is more environmentally friendly
than processes such CVD.
Disadvantages
High capital cost
Equipment size large because vacuum required
Processes requiring large amounts of heat require
appropriate cooling systems
The rate of coating deposition is usually quite slow
8. PLASMA ENHANSED CHEMICAL VAPOUR DEPOSITION
Combined process of both CVD and PVD
a process used to deposit thin films from a gas state
(vapour)
to a solid state on a substrate.
Chemical reactions are involved in the process, which
occur after creation of a plasma of the reacting gases
The plasma is generally created by RF (AC) frequency
or DC discharge between two electrodes, the space
between which is filled with the reacting gases.
Processing plasmas are typically operated at pressures
9. of a few millitorr to a few torr , although arc discharges and
inductive plasmas can be ignited at atmospheric pressure
10. Advantages of PECVD
Plasma enhanced CVD is most useful because it can deposit layers on fragile
substrates that cannot withstand the high temperatures of other CVD methods
Plasma enhanced CVD systems allow for greater control of the film
composition, density, and film stress.
Higher deposition rate at low temperature relatively
Disadvantages
Plasma can cause damage to the substrate surface when either secondary
electrons collide with the wafer surface or the energy of the ion bombard-
ment becomes too high.
High cost.
12. APPLICATION OF ANTIREFLECTION COATING
Anti-reflection coated optical windows
Reflex free sight glasses
Laser scanner windows
Contrast enhancement
Anti glare coated instrument windows
Sensor technology Glass with MgF2 coating
Low reflection camera windows
Holography components
Antireflection coated glass for displays
In microelectronic photolithography to
reduce image (substrate) distortions .
solar cell with SiO coating