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1. 6th Industrial Symposium on
Nanoimprint Lithography
23 May 2012 | 0900-1400 | IMRE SR1
Confirmed Invited International
SCOPE OF SYMPOSIUM Speakers from:
The past five annual industry symposia on nanoimprint
lithography have been excellent sources of information for
corporate attendees of all stripes, from potential end-users to
value-chain enterprises, seeking to stay abreast of the latest
developments in the field. The 6th Industrial Symposium on
Nanoimprint Lithography, 2012 will emphasize commercial
applications that are closest to production. International
speakers from companies with interests in nanoimprint
technology will emphasize this theme, as well as convey recent
developments in their respective businesses. Furthermore,
there will be corporate exhibits showcasing the latest products
produced by and for nanoimprint technology. The symposium
is intended as a platform to foster partnership and explore new
collaborations with industry.
Chair Hong Yee LOW
Institute of Materials Research and
Engineering, Singapore
Co-chair & Jaslyn LAW
Correspondence Institute of Materials Research and
Engineering, Singapore
3 Research Link, Singapore 117602
Tel: (65) 6874 7902;
Email: lawj@imre.a-star.edu.sg
REGISTRATION Organized by:
Register online by 21 May 2012 at:
http://www.imre.a-star.edu.sg/events.php?id=B531O538N534
Registration is free, however pre-registration is compulsory.