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SOFICS © 2020 Proprietary & Confidential 1
BENJAMIN VAN CAMP -SOFICS
OPTIMIZING I/O’S AND ESD PROTECTION TO REDUCE
POWER CONSUMPTION IN SOI APPLICATIONS
D&R IP-SOC DAYS
An IC through the eyes of an ESD engineer
SOFICS © 2020 Proprietary & Confidential 2
GND
VDD
Output Input
I/O ESD architectures
SOFICS © 2020 Proprietary & Confidential 3
Leakage I/O to GND
Leakage I/O to VDD
Leakage VDD to GND
VDD
GND
I/O
I/O ESD architectures
SOFICS © 2020 Proprietary & Confidential 4
…
Leakage I/O to GND
Leakage I/O to VDD
Leakage VDD to GND
VDD
GND
I/O
VDD
GND
I/O
VDD
GND
I/O
VDD
GND
I/O
Dual diode Protection
SOFICS © 2020 Proprietary & Confidential 5
• ESD protection implications
– Simplest architecture
– For large design windows
• Signal voltage implications
– VI/O > GND - 0.3V
– VI/O < VDD + 0.3V
• Leakage
– I/O - > GND: Through reverse junction of diode
– I/O - > VDD: Through reverse junction of diode
– VDD -> GND: Determined by power clamp
VDD
GND
I/O
Leakage
I/O to GND
Leakage
I/O to VDD
Leakage
VDD to GND
Diode Cross Sections
SOFICS © 2020 Proprietary & Confidential 6
Bulk SOI
STI diode
Gated Diode
Diode characteristics
SOFICS © 2020 Proprietary & Confidential 7
• Current capability:
– Forward: 20-50mA/um
– Reverse: 0.5mA/um
• Parasitics
– PNP to substrate
– Diode from substrate to cathode
• Current capability:
– Forward: 5-10mA/um
– Reverse: 0.2mA/um
• No Parasitics
Bulk SOI
0
0.1
0.2
0.3
0.4
0.5
0.6
0.7
0.8
0 1 2 3 4 5
Voltage [V]
Current [A]
Diode measurements
SOFICS © 2020 Proprietary & Confidential 8
65nm SOI
Diode perimeter: 80um
~9-10mA/um
0
0.5
1
1.5
2
2.5
3
3.5
0 0.5 1 1.5 2 2.5 3
Voltage [V]
Current [A]
65nm Bulk
Diode perimeter: 92um
~33mA/um
Diode – Reverse Leakage
SOFICS © 2020 Proprietary & Confidential 9
• Reverse diode are low leakage
– Measured in 65nm bulk
– Similar for all technologies
• Leakage @ 1.8V
– ~10pA for 25°C
– ~200pA for 125°C
10
-12
10
-10
10
-8
10
-6
10
-4
0 2 4 6 8 10 12 14 16
Voltage [V]
Current [A]
25°C
125°C Thermochuck
induced noise
1.8V
I/O ESD architectures
SOFICS © 2020 Proprietary & Confidential 10
…
Leakage I/O to GND
Leakage I/O to VDD
Leakage VDD to GND
VDD
GND
I/O
VDD
GND
I/O
VDD
GND
I/O
VDD
GND
I/O
Secondary Protection
SOFICS © 2020 Proprietary & Confidential 11
• ESD protection implications
– Simple architecture
 Diodes take most of ESD current
 Secondary protection limits voltage
– Secondary protection can be small
– For smaller design windows
– CDM sensitive pins
• Signal voltage implications
– VI/O > GND - 0.3V
– VI/O < VDD + 0.3V
Leakage
I/O to GND
Leakage
I/O to VDD
VDD
GND
I/O
Leakage
VDD to GND
Secondary Protection
SOFICS © 2020 Proprietary & Confidential 12
• Leakage
1. I/O - > GND:
 Path 1: Through reverse junction of diode
 Path 2: Through Secondary clamp
-> Assume small ggNMOS
2. I/O - > VDD:
 Path 1: Through reverse junction of diode
 Path 2: Through Secondary clamp
-> Assume small ggNMOS
3. VDD -> GND: Determined by power clamp
 + Sum of secondary clamps  Typically
negligible
Leakage
I/O to GND
Leakage
I/O to VDD
Leakage
VDD to GND
VDD
GND
I/O
NMOS in Snapback – one slide explanation
SOFICS © 2020 Proprietary & Confidential 13
1. Gate Grounded
– Voltage increases
– No current flow
2. Breakdown voltage drain-substrate reached
– Avalanching at drain
– Small current flow from drain to GND
3. Voltage built up over substrate resistance
– Substrate- Source reaches 0.7V
– NPN turns on
– Avalanching voltage lowered
 Snapback
I
V
I
V
I
V
1
2
3
NMOS in bulk technology – cross section
SOFICS © 2020 Proprietary & Confidential 14
• NMOS in bulk technology has a shared p-substrate
– Large volume for Heat dissipation
– This shared p-substrate will help to trigger all the fingers
SOI MOS
SOFICS © 2020 Proprietary & Confidential slide 15
• SOI MOS
– Less volume for heat dissipation
– Body regions are isolated  No body coupling between fingers
A
A’
GGNMOS Measurements
SOFICS © 2020 Proprietary & Confidential slide 16
0
0.5
1
1.5
2
2.5
0 1 2 3 4 5 6
current [A]
voltage [V]
90nm bulk process
It2 ~ 6 mA/um
• Bulk NMOS much higher It2
– Bulk: 5-10 mA/um
– SOI: 1-3 mA/um
• Voltages comparable
– SOI devices slightly lower trigger and holding voltage
0
0.5
1
1.5
2
2.5
0 0.5 1 1.5 2 2.5 3 3.5 4
current [A]
voltage [V]
90nm SOI process
It2 ~ 2.4 mA/um
SOI MOS devices - Degradation
SOFICS © 2020 Proprietary & Confidential 17
• Often degradation is seen
– Don’t use these devices Factor 10
ESD SOI MOS
Seen in many MOS
devices in SOI
SOI MOS Variation
SOFICS © 2020 Proprietary & Confidential 18
130nm SOI
Foundry ESD Solution
Measured over
multiple samples
Leakage ~few nA
or lower
I/O ESD architectures
SOFICS © 2020 Proprietary & Confidential 19
…
Leakage I/O to GND
Leakage I/O to VDD
Leakage VDD to GND
VDD
GND
I/O
VDD
GND
I/O
VDD
GND
I/O
VDD
GND
I/O
I/O signal conditions
SOFICS © 2020 Proprietary & Confidential 20
• ESD protection implications
– Local Clamp required
 Takes all of ESD current
 Needs to limit voltage
– Local clamp large
– For smallest design windows
– CDM sensitive pins
• Local clamp options
– ggNMOS
– SCR
Leakage
I/O to GND
Leakage
I/O to VDD Leakage
VDD to GND
VDD
GND
I/O
I/O signal conditions
SOFICS © 2020 Proprietary & Confidential 21
• Conditions that require (semi) local protection
– VI/O > VDD + 0.3V
– Supply can be powered down
 Energy Saving mode
 Cold Spare
– CMRR: no I/O – VDD capacitance allowed
• Leakage
1. I/O - > GND:
 Path 1: Through reverse junction of diode
 Path 2: Through local clamp
2. I/O - > VDD: None
3. VDD -> GND: Determined by power clamp
Leakage
I/O to GND
Leakage
I/O to VDD Leakage
VDD to GND
VDD
GND
I/O
Protection Device Example (1/3) – 1.2V in 90nm SOI
Proprietary & Confidential -- Sarnoff © 2005 slide 22
0
0.5
1
1.5
2
0 1 2 3 4 5 6 7
10
-12
10
-11
10
-10
10
-9
10
-8
10
-7
10
-6
voltage [V]
leakage current [A] @ 1.32V
current[A]
W=8x30um
Vt1 = 3.2V
• SCR based power clamp in SOI
– Vhold = 2V
– Vmax = 6.4V
– Imax=7.5 mA/um
– Ron = 586.7 Ohm.um
• Leakage ~ 0.5nA/um @ 25°C
Protection Device Example (2/3) - 22nm SOI
SOFICS © 2020 Proprietary & Confidential 23
• SCR Based clamps for different domains
1.2V-1.8V – 125°C
0.8V - 125°C
0.8V – 25°C
1.2V-1.8V –25°C
Leakage
ESD performance
Protection Device Example (3/3) - 3.3V in 130nm SOI
SOFICS © 2020 Proprietary & Confidential 24
• Specialized ggNMOS based clamp
– To lower leakage
– To avoid variation
11nA, FF, 125°C
200pA, TT, 25°C
same process
I/O ESD architectures
SOFICS © 2020 Proprietary & Confidential 25
…
Leakage I/O to GND
Leakage I/O to VDD
Leakage
VDD to GND
VDD
GND
I/O
VDD
GND
I/O
VDD
GND
I/O
VDD
GND
I/O
Power protection - Leakage
SOFICS © 2020 Proprietary & Confidential 26
• Choice of power clamp is important
– Dependent on leakage/power specifications
– Dependent on power up/down strategy
– Dependent on temperature range
22nm SOI
Clamp type 25°C 125°C
0.8V Rail clamp 80nA 6uA
1.8V Rail clamp 100nA uA
0.8V SCR based <0.5nA 20nA
1.8V SCR based <0.5nA 20nA
0.8V ggNMOS 2nA
1.8V ggNMOS 10nA
Leakage
VDD to GND
VDD
GND
I/O
Conclusion - Leakage
SOFICS © 2020 Proprietary & Confidential 27
• I/O to GND
– Low leakage
• I/O to VDD
– Low leakage IF
Vsignal < VDD at all times
• VDD to I/O
– Depends on power clamp
– < 1nA @ RT possible
• I/O to GND
– Depends on local clamp
– < 1nA @ RT possible
• I/O to VDD
– Low leakage IF
Vsignal < VDD at all times
• VDD to I/O
– Depends on power clamp
– < 1nA @ RT possible
• I/O to GND
– Depends on local clamp
– < 1nA @ RT possible
• I/O to VDD
– Low leakage IF
Vsignal < VDD at all times
• VDD to I/O
– Depends on power clamp
– < 1nA @ RT possible
VDD
GND
I/O
VDD
GND
I/O
VDD
GND
I/O
Contact us
SOFICS © 2019 Proprietary & Confidential 28
• Sofics contact
Koen Verhaege
Benjamin Van Camp
Bart Keppens
info@sofics.com
engineering office
Sint-Godelievestraat 32
9880 Aalter, Belgium

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Optimizing I/O’s and ESD protection to reduce power consumption in SOI applications

  • 1. SOFICS © 2020 Proprietary & Confidential 1 BENJAMIN VAN CAMP -SOFICS OPTIMIZING I/O’S AND ESD PROTECTION TO REDUCE POWER CONSUMPTION IN SOI APPLICATIONS D&R IP-SOC DAYS
  • 2. An IC through the eyes of an ESD engineer SOFICS © 2020 Proprietary & Confidential 2 GND VDD Output Input
  • 3. I/O ESD architectures SOFICS © 2020 Proprietary & Confidential 3 Leakage I/O to GND Leakage I/O to VDD Leakage VDD to GND VDD GND I/O
  • 4. I/O ESD architectures SOFICS © 2020 Proprietary & Confidential 4 … Leakage I/O to GND Leakage I/O to VDD Leakage VDD to GND VDD GND I/O VDD GND I/O VDD GND I/O VDD GND I/O
  • 5. Dual diode Protection SOFICS © 2020 Proprietary & Confidential 5 • ESD protection implications – Simplest architecture – For large design windows • Signal voltage implications – VI/O > GND - 0.3V – VI/O < VDD + 0.3V • Leakage – I/O - > GND: Through reverse junction of diode – I/O - > VDD: Through reverse junction of diode – VDD -> GND: Determined by power clamp VDD GND I/O Leakage I/O to GND Leakage I/O to VDD Leakage VDD to GND
  • 6. Diode Cross Sections SOFICS © 2020 Proprietary & Confidential 6 Bulk SOI STI diode Gated Diode
  • 7. Diode characteristics SOFICS © 2020 Proprietary & Confidential 7 • Current capability: – Forward: 20-50mA/um – Reverse: 0.5mA/um • Parasitics – PNP to substrate – Diode from substrate to cathode • Current capability: – Forward: 5-10mA/um – Reverse: 0.2mA/um • No Parasitics Bulk SOI
  • 8. 0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0 1 2 3 4 5 Voltage [V] Current [A] Diode measurements SOFICS © 2020 Proprietary & Confidential 8 65nm SOI Diode perimeter: 80um ~9-10mA/um 0 0.5 1 1.5 2 2.5 3 3.5 0 0.5 1 1.5 2 2.5 3 Voltage [V] Current [A] 65nm Bulk Diode perimeter: 92um ~33mA/um
  • 9. Diode – Reverse Leakage SOFICS © 2020 Proprietary & Confidential 9 • Reverse diode are low leakage – Measured in 65nm bulk – Similar for all technologies • Leakage @ 1.8V – ~10pA for 25°C – ~200pA for 125°C 10 -12 10 -10 10 -8 10 -6 10 -4 0 2 4 6 8 10 12 14 16 Voltage [V] Current [A] 25°C 125°C Thermochuck induced noise 1.8V
  • 10. I/O ESD architectures SOFICS © 2020 Proprietary & Confidential 10 … Leakage I/O to GND Leakage I/O to VDD Leakage VDD to GND VDD GND I/O VDD GND I/O VDD GND I/O VDD GND I/O
  • 11. Secondary Protection SOFICS © 2020 Proprietary & Confidential 11 • ESD protection implications – Simple architecture  Diodes take most of ESD current  Secondary protection limits voltage – Secondary protection can be small – For smaller design windows – CDM sensitive pins • Signal voltage implications – VI/O > GND - 0.3V – VI/O < VDD + 0.3V Leakage I/O to GND Leakage I/O to VDD VDD GND I/O Leakage VDD to GND
  • 12. Secondary Protection SOFICS © 2020 Proprietary & Confidential 12 • Leakage 1. I/O - > GND:  Path 1: Through reverse junction of diode  Path 2: Through Secondary clamp -> Assume small ggNMOS 2. I/O - > VDD:  Path 1: Through reverse junction of diode  Path 2: Through Secondary clamp -> Assume small ggNMOS 3. VDD -> GND: Determined by power clamp  + Sum of secondary clamps  Typically negligible Leakage I/O to GND Leakage I/O to VDD Leakage VDD to GND VDD GND I/O
  • 13. NMOS in Snapback – one slide explanation SOFICS © 2020 Proprietary & Confidential 13 1. Gate Grounded – Voltage increases – No current flow 2. Breakdown voltage drain-substrate reached – Avalanching at drain – Small current flow from drain to GND 3. Voltage built up over substrate resistance – Substrate- Source reaches 0.7V – NPN turns on – Avalanching voltage lowered  Snapback I V I V I V 1 2 3
  • 14. NMOS in bulk technology – cross section SOFICS © 2020 Proprietary & Confidential 14 • NMOS in bulk technology has a shared p-substrate – Large volume for Heat dissipation – This shared p-substrate will help to trigger all the fingers
  • 15. SOI MOS SOFICS © 2020 Proprietary & Confidential slide 15 • SOI MOS – Less volume for heat dissipation – Body regions are isolated  No body coupling between fingers A A’
  • 16. GGNMOS Measurements SOFICS © 2020 Proprietary & Confidential slide 16 0 0.5 1 1.5 2 2.5 0 1 2 3 4 5 6 current [A] voltage [V] 90nm bulk process It2 ~ 6 mA/um • Bulk NMOS much higher It2 – Bulk: 5-10 mA/um – SOI: 1-3 mA/um • Voltages comparable – SOI devices slightly lower trigger and holding voltage 0 0.5 1 1.5 2 2.5 0 0.5 1 1.5 2 2.5 3 3.5 4 current [A] voltage [V] 90nm SOI process It2 ~ 2.4 mA/um
  • 17. SOI MOS devices - Degradation SOFICS © 2020 Proprietary & Confidential 17 • Often degradation is seen – Don’t use these devices Factor 10 ESD SOI MOS Seen in many MOS devices in SOI
  • 18. SOI MOS Variation SOFICS © 2020 Proprietary & Confidential 18 130nm SOI Foundry ESD Solution Measured over multiple samples Leakage ~few nA or lower
  • 19. I/O ESD architectures SOFICS © 2020 Proprietary & Confidential 19 … Leakage I/O to GND Leakage I/O to VDD Leakage VDD to GND VDD GND I/O VDD GND I/O VDD GND I/O VDD GND I/O
  • 20. I/O signal conditions SOFICS © 2020 Proprietary & Confidential 20 • ESD protection implications – Local Clamp required  Takes all of ESD current  Needs to limit voltage – Local clamp large – For smallest design windows – CDM sensitive pins • Local clamp options – ggNMOS – SCR Leakage I/O to GND Leakage I/O to VDD Leakage VDD to GND VDD GND I/O
  • 21. I/O signal conditions SOFICS © 2020 Proprietary & Confidential 21 • Conditions that require (semi) local protection – VI/O > VDD + 0.3V – Supply can be powered down  Energy Saving mode  Cold Spare – CMRR: no I/O – VDD capacitance allowed • Leakage 1. I/O - > GND:  Path 1: Through reverse junction of diode  Path 2: Through local clamp 2. I/O - > VDD: None 3. VDD -> GND: Determined by power clamp Leakage I/O to GND Leakage I/O to VDD Leakage VDD to GND VDD GND I/O
  • 22. Protection Device Example (1/3) – 1.2V in 90nm SOI Proprietary & Confidential -- Sarnoff © 2005 slide 22 0 0.5 1 1.5 2 0 1 2 3 4 5 6 7 10 -12 10 -11 10 -10 10 -9 10 -8 10 -7 10 -6 voltage [V] leakage current [A] @ 1.32V current[A] W=8x30um Vt1 = 3.2V • SCR based power clamp in SOI – Vhold = 2V – Vmax = 6.4V – Imax=7.5 mA/um – Ron = 586.7 Ohm.um • Leakage ~ 0.5nA/um @ 25°C
  • 23. Protection Device Example (2/3) - 22nm SOI SOFICS © 2020 Proprietary & Confidential 23 • SCR Based clamps for different domains 1.2V-1.8V – 125°C 0.8V - 125°C 0.8V – 25°C 1.2V-1.8V –25°C Leakage ESD performance
  • 24. Protection Device Example (3/3) - 3.3V in 130nm SOI SOFICS © 2020 Proprietary & Confidential 24 • Specialized ggNMOS based clamp – To lower leakage – To avoid variation 11nA, FF, 125°C 200pA, TT, 25°C same process
  • 25. I/O ESD architectures SOFICS © 2020 Proprietary & Confidential 25 … Leakage I/O to GND Leakage I/O to VDD Leakage VDD to GND VDD GND I/O VDD GND I/O VDD GND I/O VDD GND I/O
  • 26. Power protection - Leakage SOFICS © 2020 Proprietary & Confidential 26 • Choice of power clamp is important – Dependent on leakage/power specifications – Dependent on power up/down strategy – Dependent on temperature range 22nm SOI Clamp type 25°C 125°C 0.8V Rail clamp 80nA 6uA 1.8V Rail clamp 100nA uA 0.8V SCR based <0.5nA 20nA 1.8V SCR based <0.5nA 20nA 0.8V ggNMOS 2nA 1.8V ggNMOS 10nA Leakage VDD to GND VDD GND I/O
  • 27. Conclusion - Leakage SOFICS © 2020 Proprietary & Confidential 27 • I/O to GND – Low leakage • I/O to VDD – Low leakage IF Vsignal < VDD at all times • VDD to I/O – Depends on power clamp – < 1nA @ RT possible • I/O to GND – Depends on local clamp – < 1nA @ RT possible • I/O to VDD – Low leakage IF Vsignal < VDD at all times • VDD to I/O – Depends on power clamp – < 1nA @ RT possible • I/O to GND – Depends on local clamp – < 1nA @ RT possible • I/O to VDD – Low leakage IF Vsignal < VDD at all times • VDD to I/O – Depends on power clamp – < 1nA @ RT possible VDD GND I/O VDD GND I/O VDD GND I/O
  • 28. Contact us SOFICS © 2019 Proprietary & Confidential 28 • Sofics contact Koen Verhaege Benjamin Van Camp Bart Keppens info@sofics.com engineering office Sint-Godelievestraat 32 9880 Aalter, Belgium

Notas do Editor

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  2. ICSS
  3. ICSS