1. Publicationsand seminars
Patent
US 8,877,151: NOx reduction using a Zn- and/or Ga-containing catalyst
S. Rivillon, Air Products and Chemicals, Nov 4th, 2014
Book chapter
Passivation and Characterization of Germanium Surfaces
S. Rivillon, Y. J. Chabal, edited by A. Dimoulas, E. P. Gusev, P. McIntyre and M.
Heyns, in press, Springer Verlag (2006)
Refereed publications
Nano patterning Si(111) Surfaces as a Selective Surface Chemistry Route
D. J. Michalak, S. Rivillon Amy, D. Aureau, M. Dai, A. Esteve, Y. J. Chabal, Nature
Mat., 9(3), 266 (2010)
The Structure and Vibrational Spectrum of the Si(111)-H/Cl Surface
F. A. Fergusson, S. Rivillon, Y. Chabal, L Raghavachari, J. Phys. Chem. C, 113(52),
21713 (2009)
Attachment of 3-(aminopropyl)triethoxysilane on Silicon Oxide Surfaces: Dependence
on Solution Temperature
R. Pasternak, S. Rivillon Amy, Y. J. Chabal, Langmuir, 24(22), 12963 (2008)
Effective Surface Passivation Methodologies for High Performance Germanium Metal
Oxide Semiconductor Field Effect Transistors
H. J. Na, J. C. Lee,D. Heh, P. Sivasubramani, P. D. Kirsch, J. W. Oh, P. Majhi, S.
Rivillon, Y. J. Chabal, B. H. Lee, R. Choi, Appl. Phys. Lett., 93(19), 192115 (2008)
Investigation of the Chemical Purity of Silicon Surfaces Reacted with Liquid Methanol
D. J. Michalak, S. Rivillon Amy, A. Esteve, Y. J. Chabal, J. Phys. Chem. C, 112(31),
11907 (2008)
Testing the effect of Surface Coatings on Alkali Atom Polarization Lifetimes
S. J. Seltzer, D. M. Rampulla, S. Rivillon Amy, Y. J. Chabal, S. L. Bernasek, M. V.
Romalis, J. Appl. Phys., 104(10), 103116 (2008)
UV-induced Immobilization of Tethered Zirconocenes of H-terminated Silicon
Surfaces
H. Gruber-Woefler, S. Rivillon Amy, Y. J. Chabal, G. Chitter, E. Polo, M. Ringwald, J.
G. Khinast, Chem. Comm., 11, 1329 (2008)
Characterization of Ultra-Thin Hafnium Oxide Films grown on Silicon by Atomic Layer
Deposition using Tetrakis(ethylmethyl-amino)hafnium and Water Precursors
Y. Wang, M. T. Ho, L. V. Gonchorova, L. S. Wielunski, S. Rivillon Amy, Y. J. Chabal,
T. Gustafsson, N. Mounem, M. Boleslawski, Chem. Mater., 19(13), 3127 (2007)

2. Erratum: Molecular Ordering in Bis(phenylenyl)bithiophenes
M. A. Stickle, R. Kortan, S. Rivillon Amy, H. E. Katz, Y. J. Chabal, C. Kloc, T. Siegrist,
J. Mater. Chem, 17(32), 3461 (2007)
In-Situ Infrared Absorption Monitoring of Atomic Layer Deposition of Metal Oxide on
Functionnalized Si and Ge Surfaces
M. Dai, J. Kwon, M. T. Ho, Y. Wang, S. Rivillon, M. Li, Y. J. Chabal, Mat. Res. Soc.
Symp. Proc., 996, 145 (2007)
Investigation of the Reactions during Alkylation of Chlorine terminated Silicon (111)
Surfaces
S. Rivillon Amy, D. J. Michalak, Y. J. Chabal, L. Wielunski, P. T. Hurley, N. S. Lewis,
J. Phys. Chem. C, 111(35), 13053 (2007)
Molecular Ordering in Bis(phenylenyl)bithiophenes
M. A. Stickle, R. Kortan, S. Rivillon Amy, H. E. Katz, Y. J. Chabal, C. Kloc, T. Siegrist,
J. Mater. Chem., 17(32), 3427 (2007)
Wet Chemical Cleaning of Germanium Surfaces for Growth of High-k Dielectrics
S. Rivillon Amy, Y. J. Chabal, F. Amy, A. Kahn, C. Krugg, P. Kirsch, in Gate Stack
Scaling -- Materials Selection, Role of Interfaces, and Reliability Implications, edited
by R. Jammy, A. Shanware, V. Misra, Y. Tsunashima, S. De Gendt (Mater. Res. Soc.
Symp. Proc. 917E, Warrendale, PA), 917-E01-05 (2006)
Infrared Spectroscopic Investigation of the Reaction of Hydrogen-Terminated, (111)-
Oriented, Silicon Surfaces with Liquid Methanol
D. J. Michalak, S. Rivillon Amy, Y. J. Chabal, A. Esteve, N. S. Lewis, J. Phys. Chem.
B, 110(41), 20426 (2006)
In Situ Infrared Adsorption Spectroscopy for Thin Film Growth by Atomic Layer
Deposition
Y. Wang, M. Dai, M. T. Ho, S. Rivillon, Y. J. Chabal, Mat. Res. Soc. Symp. Proc.,
967, 549 (2006)
In Situ Infrared Adsorption Spectroscopy for Thin Film Growth by Atomic Layer
Deposition
Y. Wang, M. Dai, S. Rivillon, M. T. Ho, Y. J. Chabal, Proc. SPIE-The International
Society for Optical Engineering, 6325, 63250G (2006)
Thermal Stability of Amorphous LaScO3 Films on Silicon
L. F. Edge, D. G. Schlom, S. Rivillon, Y. J. Chabal, M. P. Agustin, S. Stemmer, T.
Lee, M. J. Kim, H. S. Craft, J-P. Maria, M. E. Hawle, B. Holländer and J. Schuber, K.
Eisenbeiser, Appl. Phys. Lett., 89(6), 062902 (2006)

3. Transmission Infrared Spectroscopy of Methyl- and Ethyl-terminated Silicon(111)
Surfaces
L. J. Webb, S. Rivillon, D. J. Michalak, Y. J. Chabal, N. S. Lewis, J. Phys. Chem. B.,
110, 7349 (2006)
Alkylation of Silicon(111) Surfaces
S. Rivillon, Y. J. Chabal, J. Phys. IV France, 132, 195 (2006)
Chlorination of Hydrogen-terminated Silicon (111) Surfaces
S. Rivillon, Y. J. Chabal, L. J. Webb, D. J. Michalak, N. S. Lewis, M. D. Halls, K.
Raghavachari, J. Vac. Sci. Technol. A: Vacuum, Surfaces and Films, 23(4), 1100
(2005)
Structural Characterization of a Functionalized Organic Semiconductor
M. A. Stickle, R. Kortan, S. Rivillon, Z. Bao, H. Katz, Y. J. Chabal, Mat. Res. Soc.
Symp. Proc., 871, 85 (2005)
Controlled Silicon Surface Functionalization by Alkene Hydrosilylation
A. Langner, A. Panarello, S. Rivillon, O. Vassylyev, J. G. Khinast, Y. J. Chabal, J.
Am. Chem. Soc., 127, 12798 (2005)
Water Reaction with Chlorine-terminated Silicon(111) and (100) Surfaces
S. Rivillon, R. T. Brewer, Y. J. Chabal, Appl. Phys. Lett., 87, 173118 (2005)
Hydrogen Passivation of Germanium(100) Surface using Wet Chemical Preparation
S. Rivillon, Y. J. Chabal, F. Amy, A. Kahn, Appl. Phys. Lett., 87, 253101 (2005)
Semiconductor Surface Chemical Functionalization for Microelectronics Applications:
Chlorination of Hydrogen-Passivated (111) Silicon Surfaces
S. Rivillon, Y. J. Chabal, L. J. Webb, D. J. Michalak, N. S. Lewis, M. D. Halls, K.
Raghavachari, J. Vac. Sci Technol., 23(4), 1100, (2005)
High-k Gate Dielectrics on Silicon and Germanium: Impact of Surface Preparation
M. M. Frank, H. Shang, S. Rivillon, F. Amy, C.-L. Hsueh, V. K. Paruchuri, R. T. Mo,
M. Copel, E. P. Gusev, M. A. Gribelyuk, Y. J. Chabal, Solid State Phenom. 103-104,
3 (2005)
Silicon Surface Functionalization by UV-initiated Alkene Hydrosilylation
A. Langner, A. Panarello, S. Rivillon, O. Vassylev, L. Khinast, Y. J. Chabal, AIChE,
Annual Meeting Conference Proceedings (2005)
Gas Phase Chlorination of H-Passivated Silicon Surfaces
S. Rivillon, F. Amy, Y. J. Chabal, M. M. Frank, Appl. Phys. Lett., 85(12), 2583 (2004)
Experimental Study of the Dynamic Properties of Monolayers PS-PEO Block
Copolymers: the Attractive Monomers-Surface Case.

4. S. Rivillon, M. G. Munoz, F. Monroy, F. Ortega, R. G. Rubio, Macromolecules,
36(11), 4068 (2003)
Dilational Rheology of Monolayers of a Miscible Polymer Blends: From Good to Poor
Solvent Conditions.
S. Rivillon, F. Monroy, F. Ortega and R. G. Rubio, E.P.J.E, 9, 375 (2002)
Dilational Rheology of Langmuir Polymer Monolayers: Poor-Solvent Conditions.
F. Monroy, S. Rivillon, F. Ortega, R. G. Rubio, J. Chem. Phys., 115, 530 (2001)
Is the Chain Dynamics in Thin Polymer Films Isotropic?
S. Rivillon, P. Auroy, B. Deloche, J. Phys. IV, 10, 233 (2000)
Chain Segment Order in Polymer Thin Films on a Non-Adsorbing Surface: a NMR
study
S. Rivillon, P. Auroy, B. Deloche, Phys. Rev. Lett., 84(3), 499 (2000)
Composition and Structure of the β-SiC(100)2x1 Surface Monitored by
Photoemission Spectroscopy using Synchrotron Radiation
L. Douillard, F. Semond, P. Soukiassian, D. Dunham, F. Amy, S. Rivillon and Z.
Hurych, Surf. Rev. Lett., 5, 213 (1998)
Direct SiO2/β-SiC(100) 3x2 Interface Formation from 25°C to 500°C.
F. Semond, L. Douillard, P. Soukiassian, D. Dunham, F. Amy and S. Rivillon, Appl.
Phys. Lett., 68, 2144 (1996)
Contributed talks
Controlled Silicon surface functionalization by alkene hydrosilylation for catalysis
applications, S. Rivillon Amy, A. Langner, A. Panarello, O. Vassyliev, J. Khinast, Y.
Chabal
ECOSS 24, Paris (France), September 2006
Alkene hydrosilylation of silicon surfaces using UV light, S. Rivillon, A. Langner, Y. J.
Chabal, A. Panarello, O. Vassylyev, J. G. Khinast
Twentieth annual symposium of the Laboratory for Surface Modification, Piscataway,
NJ (USA), March 2006
Alkylation of silicon and germanium surfaces, S. Rivillon, Y. J. Chabal A
VS 52nd International Symposium, Boston, Ma (USA), November 2005
Alkene hydrosilylation of silicon surfaces, S. Rivillon, A. Langner, Y. J. Chabal, A.
Panarello, O. Vassylyev, J. G. Khinast
AVS 52nd International Symposium, Post-deadline session, Boston, Ma (USA),
November 2005

5. Alkylation of silicon (111) surfaces, S. Rivillon, Y. J. Chabal
10th International Conference on the Formation of Semiconductor Interfaces 10, Aix
en Provence (France), July 2005
Wet chemistry on germanium (100) for high-κ dielectric growth, S. Rivillon, K. A.
Bratland, Y. J. Chabal, F. Amy, A. Kahn, M. P. Boleslawski
37th ACS Middle Atlantic Regional Meeting 2005, Piscataway, NJ (USA), April 2005
Growth of hafnium oxide on passivated germanium (100), S. Rivillon, Y. J. Chabal, F.
Amy, A. Kahn, K. Bratland, L. Wielunski
2005 MRS spring meeting, San Francisco, Ca (USA), March 2005
Passivation of Ge(100) substrates for high-κ growth, S. Rivillon, K. Bratland, Y. J.
Chabal Nineteen annual symposium of the Laboratory for Surface Modification,
Piscataway, NJ (USA), March 2005
Semiconductor surface chemical functionalization for microelectronics applications:
gas phase chlorination of H-passivated silicon surfaces, S. Rivillon, F. Amy, Y. J.
Chabal, M. M. Frank
AVS 51st International Symposium, Anaheim, Ca (USA), November 2004
Gas phase chlorination of H-passivated silicon substrate, S. Rivillon, Y. J. Chabal
Eighteen annual symposium of the Laboratory for Surface Modification, Piscataway,
NJ (USA), February 2004
Ternary phase diagram of (PBA-PAA) diblock copolymer, S. Rivillon, V. Ponsinet, M.
Joanicot 6th European Workshop on Scattering Methods to Soft Condensed Matter,
Bombannes (France), May 2002
Reologia de monocapas de polimeros: comparacion entre condiciones de buen y mal
disolvente. S. Rivillon, F. Monroy, F. Ortega, R. G. Rubio.
4a Reunion del grupo especializado de coloidas e interfases (GECI), Barcelona
(Spain), July 2000
Segmental Order of free polymer chains in thin films: a deuterium NMR investigation,
S. Rivillon, P. Auroy, B. Deloche
17th General Conference of the Condensed Matter Division (CMD17-JMC6),
Grenoble (France), August 1998
Segmental order and dynamics of free polymer chains in thin films: a deuterium NMR
investigation, S. Rivillon, P. Auroy, B. Deloche.
2nd International Workshop on Wetting and Self Organization in Thin Liquid Films,
Munich (Germany), March 1998

6. Invited talks
Surface rheology of polymer and copolymer systems, Rhodia Inc, Cranbury USA
(2001)
Dynamics and local order of Polydimethylsiloxane thin films, Laboratory Institut für
Makromolekular Chemie, Universitaat von Freiburg, Germany (1999)
Chain segment order in polymer thin films on a non-adsorbing surface, Departamento
de Quimica Fisica I, Universidad Complutense de Madrid, Spain (1999)
Effect of the polymer length on the dynamic and local order of polymer chains,
Instituut voor Technische Scheikunde, Universiteit van Amsterdam, The Netherlands
(1999)
Deuterium NMR study of PDMS films on a non-adsorbing surface, Laboratoire de
Physique des Solides, Université de Paris Sud, Orsay, France (1998)