3. INTRODUCTION
Process simulation of field oxide bird’s beak in ATHENA.
Interface of the 2D structure from ATHENA to DEVEDIT3D.
Structure editing to create 3D MOSFET.
Interface of the 3D structure from DEVEDIT3D to ATLAS.
Simulation of the Id / Vgs characterstics in ATLAS.
Extraction of Vt for change in value of width.
6. NARROW WIDTH EFFECT
As we are shrinking down device size,
Narrow Width Effect comes into existence in device isolation
technique.
LOCOS : Normal Narrow Width Effect.
TRENCH ISOLATION TECHNIQUE : Reverse Narrow
Width Effect.