1. th
6 Industrial Symposium on
Nanoimprint Lithography
&
Industry Session on
Nanotechnology Standards
23rd May 2012 | 0900 -1600 | Seminar Room 1
Institute of Materials Research and Engineering
3 Research Link, Singapore 117602
Roll-to-roll nanoimprinting Direct imprinting of high resolution Water pinning on nano-structured
TiO2 nanostructures plastic film
Invited international speakers from:
Co-organised by: Supported by:
Register online by 21 May 2012 at http://www.imre.a-star.edu.sg/events.php?id=B531O538N534
Registration is free, however pre-registration is compulsory.

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6 Industrial Symposium on Nanoimprint Lithography & Industry Session on Nanotechnology Standards
23 May 2012 ∙ IMRE, Singapore
SCOPE OF 6th INDUSTRIAL SYMPOSIUM ON NANOIMPRINT LITHOGRAPHY
The past five annual industry symposia on nanoimprint lithography have been excellent
sources of information for corporate attendees of all stripes, from potential end-users to
value-chain enterprises, seeking to stay abreast of the latest developments in the field. The
6th Industrial Symposium on Nanoimprint Lithography, 2012 will emphasise commercial
applications that are closest to production. International speakers from companies with
interests in nanoimprint technology will emphasise this theme, as well as convey recent
developments in their respective businesses. Furthermore, there will be corporate exhibits
showcasing the latest products produced by and for nanoimprint technology. The
symposium is intended to be a platform for fostering new partnership and explore new
collaborations with industry.
Chairperson (6th Industrial Symposium on Nanoimprint Lithography)
Chair Hong Yee LOW
Institute of Materials Research and Engineering, Singapore
Co-chair & Jaslyn LAW
Correspondence Institute of Materials Research and Engineering, Singapore
3 Research Link, Singapore 117602
Tel: (65) 6874 7902;
Email: lawj@imre.a-star.edu.sg
Edwin KHOO
Institute of Materials Research and Engineering, Singapore
3 Research Link, Singapore 117602
Tel: (65) 6874 1975;
Email: edwin-khoo@imre.a-star.edu.sg

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6 Industrial Symposium on Nanoimprint Lithography & Industry Session on Nanotechnology Standards
23 May 2012 ∙ IMRE, Singapore
SCOPE OF INDUSTRY SESSION ON NANOTECHNOLOGY STANDARDS
The National Working Group for Nanotechnology Standards represents Singapore in the
International Organisation for Standardisation (ISO) Technical Committee (TC) 229 on
nanotechnology standards. ISO has 163 member countries involved in preparing
international standards through ISO TCs. The National Working Group participates in ISO
TC 229 on nanotechnologies which focuses on four main themes, namely: i) Terminology
and Nomenclature ii) Measurement and Characterisation iii) Health, Safety and Environment
and iv) Materials Specifications. Research laboratories, industry, consumers, trade,
government, distributors, etc. are involved through their national working groups for their
country, tapping on international expert networks and shaping ISO standards to facilitate
trade, improve quality and safety and protect health. The National Working Group for
Nanotechnology Standards is an active member in the ISO TC 229 and is committed to work
effectively with all relevant parties in Singapore. The industry session will highlight the
relevance of particular ISO TC 229 nanotechnology standards to Singapore’s industry and
research entities and how they could connect to the ISO standards platform given the
potential impact of nanotechnology on health, safety and trade.
The National Working Group for Nanotechnology Standards is under the Chemical
Standards Committee (CSC) which is managed by the Standards Development Organisation
at the Singapore Chemical Industry Council (SDO@SCIC). The CSC is one of the 11
Standards Committees under the Standards Council which is administered by SPRING
Singapore, the national standards body.
Chairperson (Industry Session on Nanotechnology Standards)
Chair Ramam AKKIPEDDI
Institute of Materials Research and Engineering, Singapore
Co-chair & Angeline POH
Correspondence SDO@SCIC, Singapore Chemical Industry Council
8 Jurong Town Hall Road #25-04, the JTC Summit
Tel: (65) 6267 9661;
Email: angeline@scic.sg

4. Time Programme
0900 Registration
0930 Opening Speech
By Professor Andy Hor (Executive Director, Institute of Material Research and Engineering,
A*STAR)
0940 Appreciation Ceremony for ICON Project 1 & 2 Consortium Members
1010 Nanoimprint Lithography for Biomedical Device Manufacturing
By Mr. Gerald Kreindl (EVG)
1025 High-Throughput UV Nanoimprint Process Using Resin Mold for High-Brightness Light-
Emitting Diodes
By Mr. Takafumi Okawa (Toshiba Machine CO LTD)
1040 Break
1110 A Universal Scheme for Direct Nanoimprint Lithography of Oxides
By Dr. MSM Saifullah (Institute of Material Research and Engineering, A*STAR)
1125 Resist Materials for Industrial Nanoimprint Processes
By Dr. Marko Vogler (micro resist technology GmbH)
1140 Nanoimprint Molds Produced Using Multi-Processing Fabrication
By Dr. Chiharu Takahashi (NTT Advanced Technology Corporation)
1155 New Applications for Nanoimprint
By Mr. Theodor Kamp Nielsen (NIL Technology ApS)
1210 Recent Progress on Wafer and Seamless Roller Nano-imprint Molds for HDD, LED and
Display Applications
By Mr. Tsuyoshi Watanabe ( HOYA Corporation)
1225 Lunch
1400 A Large Scaled Moth-Eye Film Development and Its Application
By Mr. Tatsuo Shirahama (InnoX Co, Ltd)
1415 Manufacturing of Engineered Micro- and Nano-structures
By Dr. Melvin Zin (3M Singapore R&D Center)
1430 International Nanotechnology Standards and Singapore
By Professor Andy Hor (Chairperson, Working Group for Nanotechnology Standards)
1445 International Perspectives on Nanotechnology Risk Issues - Synopsis
By Professor Rob Aitken (Director of Strategic Consulting, Institute of Occupational Medicine &
Director, SAFENANO initiative)
1500 Using the International Nanotechnology Standards ISO TC 229 Platform for Industry
By Dr. Akkipeddi Ramam (Singapore Representative, Working Group for Nanotechnology
Standards)
1515 Closing Remark
By Mr. Yi-Hsen Gian (Director, Industry Identification and Incubation, Singapore Economic
Development Board )
1530 End of Programme and Tea Break