One of the critical challenges of high volume precision optics is to achieve consistency in production without sacrificing the number of parts that can be produced per hour. Our new, high-rate cerium oxide slurry, Nanophase CE-6950, represents a new approach to meet this challenge. Request a sample: http://nanophase.com/not-nav/optical-slurry-sample-request/

1. We Make NanoTechnology Work!® |
High Rate Polishing Slurry for
Precision Optics
Nanophase CE-6950

2. We Make NanoTechnology Work!® |
CE-6950 High Rate Slurry Technology
• Best in class removal rates achieved through novel
composition
• Consistency in achieving desired specifications during initial
processing without sacrificing the number of parts that can
be produced per hour
• Broad pH stability and tunability for polishing a wide range
of glass types
• Requires less topping off while maintaining high removal
rates resulting in lowering your slurry waste and production
costs
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CE-6950 Removal Rate versus Large Particles
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9,055
8,305
7,977
7,400 7,600 7,800 8,000 8,200 8,400 8,600 8,800 9,000 9,200
CE-6950
Cerox 1663
Unicer 166
Average MRR (Å/min)
Fused Silica, 5.625 wt%, 55 RPM, 225 mL/min Flow Rate, using a PR-1 and Non-Embossed Suba X Pad
CE-6950 was developed to
consistently outperform the material
removal rates of the most commonly
used large ceria powders, enabling
greater productivity

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CE-6950 Longevity on Fused Silica
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5,000
5,500
6,000
6,500
7,000
7,500
8,000
8,500
9,000
9,500
10,000
2 4 6 7
AverageMRR(Å/min)
Hours of Polishing without Topping Off
Fused Silica, 5.625 wt%, 55 RPM, 225 mL/min Flow Rate, using a PR-1 and Non-Embossed Suba X Pad
CE-6950 maintains superior removal rate
without top off to keep production going

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Surface Finish Results for CE-6950
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• Consistently achieve
good surface finish –
exceeding
requirements of
most precision
applications
• Ra = 0.90 nm
• RMS = 1.1 nm
• PV= 5.0 nm

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CE-6950 Particle Size Distribution
0
2
4
6
0.0 0.1 1.0 10.0 100.0
Frequency(%)
Particle Size (Microns)
Particle Size Distribution of NanoArc CE-6950 Cerium Oxide Slurry in Water
Using Horiba LA-910 Laser Light Scattering (RRI 1.50 - 0.10i)
Volume Dist. Base
6
Mean PSD= 2.089 µm
Broad particle
size to achieve
combination
of high
removal rate
with excellent
surface quality

7. We Make NanoTechnology Work!® |We Make NanoTechnology Work!® |
Request Your Sample
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nanophase.com/high-rate-slurry-sample