ion gun milling

1. Instructions for using ion gun in tool # 1144 (updated20220630):
1. Turn off the Metal sputter ion gauge (IG1 on upper vacuum gauge controller).
2. Open the manual Ar valve on the ion gun gas supply. The Ar valve controlled by
the software should be closed, so that all Ar goes to the ion gun.
3. When you have opened the valve fully and the pressure on the Conv A is <2E-4
Torr, turn on the IG1 again.
4. Set the Ar flow setpoint to 2.0 sccm on the PC pressure control dialog box (click
the edit button below the gas shut-off valves in the software to open the pressure
control dialog box. Blue values are setpoints, green values actual flow.).
Pressure in chamber should now be ~5-6*10E-5 Torr.
5. Make sure the substrate is away from the ion gun - you can keep it at the loading
posititon to keep everything out of sight from the ion gun.
6. Turn on the ion gun power supply, allow the self-test to run and make sure the
control is set to "LOCAL", then choose memory 2. The values on the displays
should be around:
Cath. fil.current 2,3A Beam current 10 mA
Disch. voltage 49,6 V Beam voltage 500 V Acc. voltage 300 V Neut. Fil. current 2 A
(For comparison, these values will give around 5 Å/s etch rate for Au).
7. Press "Source" - this will turn on the filaments, and you should typlcally see a
discharge current of around 0,1 A.
8. Press "Beam" to turn on the ion beam, and wait a short while until it stabilizes.
Move your substrate to the ion gun (C4 or H4 on PC manipulator control).
9. Etch for the required time, then press "Beam" to turn beam off, "Source" to turn
filaments off, and finally turn the power supply off (if you plan to etch more
samples, you can leave the power on).
10. Set Ar flow to 0.0 and shut the Ar valve on the ion gun gas supply panel.
11. Run your deposition program