3. Overview Of Microfluidics’ LiteratureOverview Of Microfluidics’ Literature
Micromachining
Fabrication of micro
features or surface
characteristics in the
micro/nano level.
Fluid Dynamics
Study liquids at the
microliter and
nanoliter range, to
take advantage of
the unique fluid
behaviors that take
place at such tiny
scales.
.
Literature
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5. Abstract
Miniaturization: The trend to manufacture ever smaller products and devices.Miniaturization: The trend to manufacture ever smaller products and devices.
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6. At The End Of This Introductory
Material
Bonding / Sealing
Access-Hole Formation
Etching
Photolithography
Film Deposition
You Will Be Familiar With These Fundamental Concepts That Actually
Reflects The Micromachining Process On Silicon And Will Be Encountered In
Nearly All Publications In The Field Of Microfluidics.
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7. Microfluidics
Microfluidics can be definied as the study of
flow of fluids that are circulating in artificial,
man made, microsystems.
Physics at the micrometric scale
Microfabrication
MicrofluidicsMicrofluidics
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10. Substrate / Waver
Polymeric Materials
Fused Silica
Glass
Silicon
This term refers to a thin slice o f material that serves as
the fo undatio n upo n which channels and electro nic
devices are built.
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12. Photolithography
Photolithography is the pro cess o f transferring
geo metric shapes o n a mask to the surface o f a silico n
wafer. The steps invo lved in the pho to litho graphic
pro cess are wafer cleaning, pho to resist applicatio n, mask
alignment, expo sure and develo pment and hard-baking.
Photolithographic process; invo lves the use o f an
o ptical image (o n the pho to lito graphic mask) and a
pho to resist film (o n the substrate) to pro duce desired
patterns o n the substrate.
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13. Photolithography
The mask is then placed above the to p-face o f a
silico n substrate co ated with thin film o f pho to resist
materials.
Then, the photoresist is exposed thro ugh the
mask to an UVlight, X-rays o r E-beam (depending o n
the type o f the pho to resist and the pro cess
requirements).
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14. Photolithographic Mask
Photolithographic mask; Aquartz plate with
Chro mium patterns thro ugh which light can no t pass.
Methods of mask fabrication; laser writing,
electro n beam writing.
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15. Photoresist
A photoresist is a light-sensitive material used in
photolithography to form a patterned coating on
a surface.
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17. Etching
Etching is used in microfabrication to chemically
remove layers from the surface of a wafer during
manufacturing.
For many etch steps, part of the wafer is protected from
the etchant by a "masking" material which resists
etching.
In some cases, the masking material is a photoresist
which has been patterned using photolithography. Other
situations require a more durable mask, such as silicon
nitride and silicon oxide.
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28. Miniaturaization often leads to the
disturbance of force equilibria: volumetric
forces such as gravity cease to prevail in the
micrometric world. Instead, this world tends to
be dominated by surface forces like capillarity.
This fact leads to situations that are
sometimes surprising, and go against physical
intuition.
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Physics at the
micrometric scale
29. Physics at the
micrometric scale
Miniaturization also gives more importance
to phenomena that are negligible in the
macrometric world.
In practice, it is necessary to first determine
the new equilibria that will appear in
microsystems in order to know whether it will
be advantageous to miniaturize.
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30. Scaling Law
A ‘scaling law’ signifies:A ‘scaling law’ signifies: the law of the
variation of physical quantities with the size l of
the system or object in question.
When two forces are present, it is the force
associated with the weaker exponent that
becomes dominant in miniaturized systems.
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