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Knowledge Broker Inc
                        Guaranteed Performance Improvement.



       Lithography Performance
            Improvement.

     Equipment Manufactures Meet Technological Demands.

    Lithography equipment manufactures employ the
    greatest minds in the engineering world, designing
    cutting edge technology to meet the increasing
    demands of nanotechnology manufactures.

    Two primary contenders remain at the forefront of
    the fast paced technology sector;
                    ASML and Nikon.

    These two companies strive to satisfy the industry
    requirement for improved equipment performance,
    by integrating sophisticated metrology and
    analytics software that enables high performance
    tuning of the lithography machine.

    With portfolios of software capabilities called
    Lithography Equipment Engineering Systems
    (LEES), and Holistic Lithography, the top tool
    vendors are achieving great success is satisfying
    their customers and stretching the boundaries of
    nanotechnology.


         Performance Improvement. More than technology.

    Driving the performance improvement initiatives
    are consortiums made up of chip manufactures
    from across the semiconductor industry. Two such
    consortiums are SEMATECH and ISMI.

    Carefully outlined improvement requests, are
    articulated in international symposiums. LEES and
    Holistic Litho are two successful examples of
    technological efforts to address the articulated
    needs of the semiconductor community.

    The articulated needs of the consortium, extends
    beyond technology, beyond Overall Equipment
    Effectiveness (OEE), and into what is called
    Overall Labor Effectiveness (OLE).

    OLE is a measure of how well staff interface and
    leverage the technology at their disposal, and how
    effectively they create product using the
    technology.


         Leverage Intellectual Property . Maximize OLE.

Using the latest learning technologies and strategies,
Knowledge Broker Inc creates web based,
Performance Improvement solutions for your
enterprise.

Based upon SEMI standard E150, KBI designs
simulators that enable your staff to learn
sophisticated software like ASML’s Tachyon SMO,
                                                                            CERTIFED
or Nikon’s Technology Aberration Optimization                              CONFIDENCE.
TAO.

KBI contends that success will not only be in the
integration of cutting edge technology, but how well
the labor components are prepared to perform using
that technology.

Provide your staff, reusable, cost effective web                     Educate and Simulate on
based learning opportunities now, and leverage the                    lithography topics like:
intellectual power of your enterprise.                               Tachyon SMO
                                                                     Tech Aberration Optimization TAO
Improve your OLE, and provide your customers the                     FlexRay
confidence they need to continue to invest in your                   LithoTuner

vision.                                                              Infrared Aberration Control – IAC
                                                                     BaseLiner
                                                                     OLEV Overlay Evaluation Program
                                                                     YieldStar
                                                                     Optimized Dose Control – ODC
                                                                     Grid Compensation for Matching




.
Questions or comments? E-mail us at palbert@knowledgebrokerinc.com

Or call: 719.494.6478
           http://www.knowledgebrokerinc.com

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Nikon Asml. Performance Improvement Efforts V2

  • 1. Knowledge Broker Inc Guaranteed Performance Improvement. Lithography Performance Improvement. Equipment Manufactures Meet Technological Demands. Lithography equipment manufactures employ the greatest minds in the engineering world, designing cutting edge technology to meet the increasing demands of nanotechnology manufactures. Two primary contenders remain at the forefront of the fast paced technology sector; ASML and Nikon. These two companies strive to satisfy the industry requirement for improved equipment performance, by integrating sophisticated metrology and analytics software that enables high performance tuning of the lithography machine. With portfolios of software capabilities called Lithography Equipment Engineering Systems (LEES), and Holistic Lithography, the top tool vendors are achieving great success is satisfying their customers and stretching the boundaries of nanotechnology. Performance Improvement. More than technology. Driving the performance improvement initiatives are consortiums made up of chip manufactures from across the semiconductor industry. Two such consortiums are SEMATECH and ISMI. Carefully outlined improvement requests, are articulated in international symposiums. LEES and Holistic Litho are two successful examples of technological efforts to address the articulated needs of the semiconductor community. The articulated needs of the consortium, extends beyond technology, beyond Overall Equipment Effectiveness (OEE), and into what is called Overall Labor Effectiveness (OLE). OLE is a measure of how well staff interface and leverage the technology at their disposal, and how effectively they create product using the technology. Leverage Intellectual Property . Maximize OLE. Using the latest learning technologies and strategies, Knowledge Broker Inc creates web based, Performance Improvement solutions for your enterprise. Based upon SEMI standard E150, KBI designs simulators that enable your staff to learn sophisticated software like ASML’s Tachyon SMO, CERTIFED or Nikon’s Technology Aberration Optimization CONFIDENCE. TAO. KBI contends that success will not only be in the integration of cutting edge technology, but how well the labor components are prepared to perform using that technology. Provide your staff, reusable, cost effective web Educate and Simulate on based learning opportunities now, and leverage the lithography topics like: intellectual power of your enterprise. Tachyon SMO Tech Aberration Optimization TAO Improve your OLE, and provide your customers the FlexRay confidence they need to continue to invest in your LithoTuner vision. Infrared Aberration Control – IAC BaseLiner OLEV Overlay Evaluation Program YieldStar Optimized Dose Control – ODC Grid Compensation for Matching . Questions or comments? E-mail us at palbert@knowledgebrokerinc.com Or call: 719.494.6478 http://www.knowledgebrokerinc.com